India and United States signed Pax Silica
Declaration at India AI Impact Summit
¨
On 20 February, the Pax
Silica Declaration was signed by India and the United States at the India AI
Impact Summit in New Delhi to deepen technology cooperation.
¨
The declaration was aimed
at strengthening collaboration in critical minerals, semiconductors and
Artificial Intelligence to build a secure global silicon ecosystem.
¨
The signing ceremony was
presided over by Union Minister Ashwini Vaishnaw, who highlighted India’s
ambition to lead in semiconductor and electronics manufacturing.
¨
It was stated that Indian
engineers are already designing advanced two-nanometer chips and that the
country is building a talent pool of over 10 lakh professionals.
¨
The minister also
informed that students from 315 universities and colleges are actively engaged
in chip design activities.
¨
US Ambassador Sergio Gor
emphasised that cooperation between the two nations has vast potential across
trade, defence and advanced technology.
¨
He noted that the Pax
Silica coalition is intended to shape the 21st-century economic and
technological order across the full silicon value chain.
¨
The initiative seeks to
secure supply chains from critical minerals and chip manufacturing to AI
deployment through trusted partnerships.
¨ The declaration aims to replace coercive dependencies with market-driven industrial cooperation between trusted nations.
¨ The partnership is expected to advance trusted AI globally while reinforcing strategic technological ties between India and the United States.
